Solvent-Free Nanofabrication Based on Ice-Assisted Electron-Beam Lithography

Citation

Hong, Y., Zhao, D., Wang, J., Lu, J., Yao, G., Liu, D., Luo, H., Li, Q., & Qiu, M. (2020). Solvent-Free Nanofabrication Based on Ice-Assisted Electron-Beam Lithography. Nano Letters, [Volume and Issue information not explicitly provided in the excerpts, refer to DOI]. doi: 10.1021/acs.nanolett.0c03809

Keywords

• Solvent-free nanofabrication
• Ice-assisted electron-beam lithography (iEBL)
• Ice lithography
• Electron-beam lithography (EBL)
• Nanofabrication
• Optical fiber device
• 3D nanostructures
• Vapor deposition
• Water ice as an electron resist
• Sublimation
• Blow-off process
• Chemical contamination avoidance
• Non-planar substrates
• Refractive index sensor
• Plasmonic nanodisk arrays
• Scanning electron microscope (SEM)
• Metal deposition chamber (MDC)
• Cryogenic sample holder
• Electron-stimulated desorption
• Fragmentation of water molecules
• Residual tensile stress

Brief

This paper introduces a solvent-free nanofabrication method using ice as an electron resist for electron-beam lithography, demonstrating its applicability on non-planar substrates like optical fibers for creating delicate nanostructures and a refractive index sensor.

Summary

This paper introduces a novel, solvent-free nanofabrication method called ice-assisted electron-beam lithography (iEBL) that uses water ice as an electron resist. This technique simplifies the process, avoids chemical contamination, and enables nanofabrication on arbitrary shaped substrates like optical fibers. The authors demonstrate the versatility of iEBL by creating delicate nanostructures, quasi-3D structures, and a functional refractive index sensor on the end face of a single-mode fiber.

Origin: https://sci.bban.top/pdf/10.1021/acs.nanolett.0c03809.pdf#