What laser is used in EUV?

Extreme Ultraviolet (EUV) Laser

Extreme Ultraviolet (EUV) lithography utilizes a specific type of laser called a CO2 laser to generate EUV light. This process is crucial in the manufacturing of semiconductor devices, allowing for the creation of extremely fine patterns on silicon wafers.

How it Works

The CO2 laser produces infrared light, which is then directed into a chamber containing tin droplets. The interaction between the laser light and the tin droplets results in the emission of EUV light at a wavelength of approximately 13.5 nm.This wavelength is significantly shorter than that of traditional deep ultraviolet (DUV) lithography, enabling the creation of smaller, more complex semiconductor devices.

CO2 Laser and EUV Generation

The efficiency and power of the CO2 laser are critical to the performance of EUV lithography. The process involves:- Precision timing to synchronize the laser pulses with the injection of tin droplets.- High-power CO2 lasers to ensure that a sufficient amount of EUV light is generated.

Due to its technical complexity and the challenge of generating EUV light, EUV lithography systems are among the most advanced and sophisticated in the semiconductor manufacturing industry.